A monolithically integrated multi-wavelength LED based on selective dielectric cap intermixing is investigated experimentally. The proposed LED emits radiation with multiple wavelength peaks from one compact easy to fabricate quantum well (QW) structure. Each wavelength has an independent emission power control, allowing the LED to radiate one or more wavelengths simultaneously. The LED material is an AlGaAs/GaAs QW p-i-n heterostructure. The device is divided into three selectively intermixed regions using an impurity-free vacancy induced intermixing technique creating localized intermixed areas. Each region is intermixed to varying extent resulting in different luminescence peaks and by separately addressing each section with its electrical current, the net emission spectrum can be fully controlled. The fabrication process starts with the growth of a 400nm thick layer of SiO2 over the whole sample using plasma enhanced chemical vapor deposition. Three regions with different SiO2 thicknesses are defined via two photolithographic and subsequent reactive ion etching steps. The sample is then annealed at 975°C for 20s to activate the intermixing of the constituent atoms of the quantum well and barrier materials. The degree of intermixing is determined by the thickness of the SiO2 cap. After removal of the SiO2 cap, contact stripes are evaporated on each region to act as an independent intensity power control for that region. Experimental results have shown that a controllable 10nm, 21nm and 33nm blue shifts of the peak wavelength of emission from that of the as-grown sample corresponding to 0, 100nm, and 400nm thick SiO2 caps respectively.
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