A novel process monitoring and control system based on a neural manufacturing concept
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This paper describes our work to produce ``smart`` equipment using a neural network to provide intelligence for process monitoring, adaptive control, metrology, and equipment diagnostics. This novel system will improve both quality and yield for critical thin films used in semiconductors, superconductors, high-density magnetic and optical storage, and advanced displays, all of which are critical to maintaining our leadership in the multibillion-dollar electronic and computer industries. The equipment will have on-line, real-time diagnostics capabilities to detect component problems early in order to minimize maintenance and downtime.