论文信息 - Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs. - 字舞流文

Structural evolution and the control of defects in atomic layer deposited HfO2-Al2O3 stacked films on GaAs.

Hyoungsub Kim | K. Chung | Y. Kang | Dae-Kyoung Kim | K. Jeong | M. Cho | Dongchan Kim | C. Y. Kim | Dong-chan Kim