Mechanisms of Pb(zr0.53Ti0.47)O3 thin film etching with ECR/RF reactor
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Nicolas Ledermann | Paul Muralt | Nava Setter | J. Baborowski | Enrico Colla | N. Setter | P. Muralt | E. Colla | J. Baborowski | S. Gentil | N. Ledermann | Andreas Seifert | S. Gentil | A. Seifert
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