Synthesis of GaN nano- and microwire crystals induced by a titanium nanolayer

The possibilities of a new method of growing gallium nitride nano- and microwire crystals using continuous titanium films with a thickness of 10–30 nm during growth are described. It is shown that this method can provide growth of high-quality GaN nanowire crystals at an extremely high rate of about 10 μm/min.

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