eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below
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Elmar Platzgummer | Hans Loeschner | Christof Klein | Stefan Cernusca | Samuel Kvasnica | Bernd Sonalkar
[1] Elmar Platzgummer,et al. 50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams , 2010, Advanced Lithography.
[2] Elmar Platzgummer,et al. Projection Mask-Less Lithography (PML2) , 2010 .