One selector-one resistor (1S1R) crossbar array for high-density flexible memory applications

Lack of a suitable selection device to suppress sneak current has impeded the development of 4F2 crossbar memory array utilizing stable and scalable bipolar resistive-switching. We report a high-performance nonlinear bipolar selector realized by a simple Ni/TiO2/Ni MIM structure with a high current density of 105 A/cm2, and a Ni/TiO2/Ni/HfO2/Pt vertically stacked 1S1R cell capable of gigabit memory implementation. Furthermore, the demonstration of 1S1R array fabricated completely at room temperature on a plastic substrate highlights the promise of future extremely low-cost flexible nonvolatile memory.

[1]  T. Hou,et al.  Electrode dependence of filament formation in HfO2 resistive-switching memory , 2011 .

[2]  T. Kauerauf,et al.  Very Low Reset Current for an RRAM Device Achieved in the Oxygen-Vacancy-Controlled Regime , 2011, IEEE Electron Device Letters.

[3]  H. Hwang,et al.  TiO2-based metal-insulator-metal selection device for bipolar resistive random access memory cross-point application , 2011 .

[4]  Meng-Fan Chang,et al.  Three-dimensional 4F2 ReRAM cell with CMOS logic compatible process , 2010, 2010 International Electron Devices Meeting.

[5]  C. H. Cheng,et al.  Very high performance non-volatile memory on flexible plastic substrate , 2010, 2010 International Electron Devices Meeting.

[6]  Tuo-Hung Hou,et al.  Transition of stable rectification to resistive-switching in Ti/TiO2/Pt oxide diode , 2010 .

[7]  Rainer Waser,et al.  Complementary resistive switches for passive nanocrossbar memories. , 2010, Nature materials.

[8]  Sung-Yool Choi,et al.  A low-temperature-grown TiO2-based device for the flexible stacked RRAM application , 2010, Nanotechnology.

[9]  G. Servalli,et al.  A 45nm generation Phase Change Memory technology , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).

[10]  Heng-Yuan Lee,et al.  A 5ns fast write multi-level non-volatile 1 K bits RRAM memory with advance write scheme , 2009, 2009 Symposium on VLSI Circuits.

[11]  I. Yoo,et al.  2-stack 1D-1R Cross-point Structure with Oxide Diodes as Switch Elements for High Density Resistance RAM Applications , 2007, 2007 IEEE International Electron Devices Meeting.

[12]  T.G. Noll,et al.  Fundamental analysis of resistive nano-crossbars for the use in hybrid Nano/CMOS-memory , 2007, ESSCIRC 2007 - 33rd European Solid-State Circuits Conference.

[13]  T. Jackson Organic thin film electronics , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

[14]  Yi-Chou Chen,et al.  An access-transistor-free (0T/1R) non-volatile resistance random access memory (RRAM) using a novel threshold switching, self-rectifying chalcogenide device , 2003, IEEE International Electron Devices Meeting 2003.