Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

In this study, we designed, fabricated, and evaluated a hard x-ray focusing mirror having an ideally focused beam with a full width at half maximum in the intensity profile of 36nm at an x-ray energy of 15keV. The designed elliptically curved shape was fabricated by a computer-controlled fabrication system using plasma chemical vaporization machining and elastic emission machining, on the basis of surface profiles accurately measured by combining microstitching interferometry with relative angle determinable stitching interferometry. A platinum-coated surface was employed for hard x-ray focusing with a large numerical aperture. Line-focusing tests on the fabricated elliptical mirror are carried out at the 1-km-long beamline of SPring-8. A full width at half maximum of 40nm was achieved in the focused beam intensity profile under the best focus conditions.

[1]  Hidekazu Mimura,et al.  Fabrication technology of hard x-ray aspherical mirror optics and application to nanospectroscopy , 2004, SPIE Optics + Photonics.

[2]  B. Lai,et al.  Nanometer focusing of hard x rays by phase zone plates , 1999 .

[3]  Hidekazu Mimura,et al.  Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror. , 2002, Journal of synchrotron radiation.

[4]  T. Ishikawa,et al.  Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining , 2003 .

[5]  T. Ishikawa,et al.  Microstitching interferometry for x-ray reflective optics , 2003 .

[6]  Hidekazu Mimura,et al.  Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining , 2003 .

[7]  Lahsen Assoufid,et al.  Elliptical x-ray microprobe mirrors by differential deposition , 2000 .

[8]  T. Ishikawa,et al.  Relative angle determinable stitching interferometry for hard x-ray reflective optics , 2005 .

[9]  T. Ishikawa,et al.  SPring-8 RIKEN beamline III for coherent X-ray optics , 2001 .

[10]  Hidekazu Mimura,et al.  Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics. , 2004, Journal of synchrotron radiation.

[11]  J. Susini,et al.  High-efficiency multilevel zone plates for keV X-rays , 1999, Nature.

[12]  Andreas K. Freund,et al.  Submicron focusing of hard x rays with reflecting surfaces at the ESRF , 2001, SPIE Optics + Photonics.

[13]  Hidekazu Mimura,et al.  Wave-optical and ray-tracing analysis to establish a compact two-dimensional focusing unit using K-B mirror arrangement , 2004, SPIE Optics + Photonics.

[14]  Y. Mori,et al.  Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining , 2002 .

[15]  Irina Snigireva,et al.  Nanofocusing parabolic refractive x-ray lenses , 2003 .