P‐185L: Late‐News Poster: Direct Patterning of Metal Electrodes for TFT‐LCD Fabrication
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In-Jae Chung | In-Byeong Kang | Youn-Gyoung Chang | Seong-Hee Nam | I. Kang | Chang-Dong Kim | I. Chung | S. Yoo | Chang-Dong Kim | Soon-Sung Yoo | Youn‐Gyoung Chang | Yun-Ho Kook | Tae-Hyoung Moon | Nam-Kook Kim | Young-Ki Jung | Y. Kook | Seong-Hee Nam | T. Moon | Nam-Kook Kim | Young‐Ki Jung
[1] In‐Byeong Kang,et al. 43.4: Enhancement of Roll Printing Accuracy for TFT‐LCD , 2008 .
[2] Xiuyu Wang,et al. Nano-silver paste with low roasting temperature , 2005, 2005 6th International Conference on Electronic Packaging Technology.
[3] Chang-Dong Kim,et al. 43.1: Distinguished Paper: Design Parameters of Roll Printing Process for TFT‐LCD Fabrication , 2008 .
[4] Kazuyuki Nakamura,et al. A new patterning process concept for large-area transistor circuit fabrication without using an optical mask aligner , 1994 .
[5] Jaegab Lee,et al. Adhesion, passivation, and resistivity of a Ag(Mg) gate electrode for an amorphous silicon thin-film transistor , 2003 .
[6] In-Jae Chung,et al. Fabrication of TFTs for LCD using 3‐mask process , 2005 .
[7] P. Ho,et al. Feasibility of an Ag-alloy film as a thin-film transistor liquid-crystal display source/drain material , 2002 .
[8] Jooho Moon,et al. Highly Conductive Ink Jet Printed Films of Nanosilver Particles for Printable Electronics , 2005 .
[9] S. Aoki,et al. A 640 × 400 pixel active-matrix LCD using a-Si TFT's , 1986, IEEE Transactions on Electron Devices.