HfO2 gate dielectrics on strained-Si and strained-SiGe layers
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Mikael Johansson | Stefan Bengtsson | Per Lundgren | Henry H. Radamson | Jonas Sundqvist | A. Hårsta | P. Lundgren | H. Radamson | S. Bengtsson | J. Sundqvist | M. Johansson | M. Yousif | Mahdi Yousif | Anders Harsta
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