Patterning of SnO2 thin films by combination of lithographic photoirradiation and pyrolysis of an organotin polymer

A lithographic photoirradiation and following pyrolysis of organotin polymer (poly(4-((trimethylstannyl)methyl)styrene)) thin films afforded a pattern of SnO2 thin films, where photochemical cross-linking of the polymer was necessary for the formation of the SnO2 films during the pyrolysis.