An analytical model for hot carrier degradation in nanoscale CMOS suitable for the simulation of degradation in analog IC applications
暂无分享,去创建一个
[1] Juin J. Liou,et al. New simple procedure to determine the threshold voltage of MOSFETs , 2000 .
[2] J.D. Plummer,et al. Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces , 1980, IEEE Transactions on Electron Devices.
[3] Georges G. E. Gielen,et al. Emerging Yield and Reliability Challenges in Nanometer CMOS Technologies , 2008, 2008 Design, Automation and Test in Europe.
[4] Chenming Hu,et al. Hot-electron-induced MOSFET degradation—Model, monitor, and improvement , 1985, IEEE Transactions on Electron Devices.
[5] H. Kufluoglu,et al. A geometrical unification of the theories of NBTI and HCI time-exponents and its implications for ultra-scaled planar and surround-gate MOSFETs , 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..
[6] Chenming Hu,et al. Hot-Electron-Induced MOSFET Degradation - Model, Monitor, and Improvement , 1985, IEEE Journal of Solid-State Circuits.
[7] Yu Cao,et al. Compact Modeling and Simulation of Circuit Reliability for 65-nm CMOS Technology , 2007, IEEE Transactions on Device and Materials Reliability.
[8] Jan M. Rabaey,et al. Digital Integrated Circuits: A Design Perspective , 1995 .
[9] Chittoor Ranganathan Parthasarathy. Etude de la fiabilité des technologies CMOS avancées : application à la simulation de la fiabilité de conception des circuits numériques et analagiques , 2006 .
[10] Hei Wong,et al. Approximation of the length of velocity saturation region in MOSFET's , 1997 .