Measurement of photoacid generation kinetics in photoresist thin films via capacitance techniques
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[1] Hans Loeschner,et al. Measuring acid generation efficiency in chemically amplified resists with all three beams , 1999 .
[2] Oleg P. Kishkovich,et al. Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities , 1999, Advanced Lithography.
[3] Sekwang Park,et al. One-bodied humidity and temperature sensor having advanced linearity at low and high relative humidity range , 2001 .
[4] P ? ? ? ? ? ? ? % ? ? ? ? , 1991 .
[5] J. Scaiano,et al. Aromatic Monoazines as Fluorescent Sensors for Photoacid Generation in Thin Polymer Films , 1996 .
[6] Gerd Pohlers,et al. Comparison of methods for acid quantification: impact of resist components on acid-generating efficiency , 2000, Advanced Lithography.
[8] G D Feke,et al. On-wafer spectrofluorometric method for determination of relative quantum yields of photoacid generation in chemically amplified resists. , 2001, Analytical chemistry.
[9] Charles R. Szmanda,et al. Evaluation of the standard addition method to determine rate constants for acid generation in chemically amplified photoresist at 157 nm , 2001, SPIE Advanced Lithography.
[10] Will Conley,et al. Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-μm geometries , 1998, Advanced Lithography.
[11] Gerd Pohlers,et al. Comparison of acid-generating efficiencies in 248 and 193-nm photoresists , 2001, SPIE Advanced Lithography.
[12] Robert J. Kavanagh,et al. Simple method for measuring acid generation quantum efficiency at 193 nm , 1999, Advanced Lithography.
[13] Scott A. MacDonald,et al. Acid generation and acid diffusion in photoresist films , 1992, Advanced Lithography.
[14] Bing Lu,et al. Evaluation of photoacid generators in chemically amplified resists for x-ray lithography using an on-wafer photoacid determination technique , 1999, Advanced Lithography.
[15] Jeff D. Byers,et al. Monitoring photoacid generation in chemically amplified resist systems , 1998, Advanced Lithography.