RF Power Measurements of InAlN/GaN Unstrained HEMTs on SiC Substrates at 10 GHz

Unstrained high-electron mobility transistors (HEMTs) were fabricated from InAlN/GaN on semi-insulating SiC substrates. The devices had 0.24-mum T-gates with a total width of 2times150 mum. Final passivated performance values for these devices are I<sub>max</sub>=1279 mA/mm, I<sub>DSS</sub>=1182 mA/mm, R<sub>c</sub>=0.43 Omegamiddotmm, rho<sub>s</sub>=315 Omega/sq, f<sub>T</sub>=45 GHz, f<sub>max(MAG) </sub>=64 GHz, and g<sub>m</sub>=268 mS/mm. Continuous-wave power measurements at 10 GHz produced P<sub>sat</sub>=3.8 W/mm, G<sub>t</sub>=8.6 dB, and PAE=30% at V<sub>DS</sub>=20 V at 25% I<sub>DSS</sub>. To our knowledge, these are the first power measurements reported at 10 GHz for this material