Selected-area Deposition Of Multiple Active Films For Conductometric Microsensor Arrays

We are currently developing a new generation of planar conductometric gas, sensors that combine active semiconducting oxide films with Si-micromachined "microhotplate" array structures. These devices would be tailored for a variety of applications by tuning both the composition of multiple types of active films and the temperature cycles programmed for individual elements within an array. In this paper we describe the approach and results for a C VD-based, "self-lithographic" microfabrication met hod being examined as a highly efficient means of depositing oxide films and low coverage catalytic metal overlayers on the microsensor elements of our microhotplate arrays.