Three-Dimensional Elemental Analysis of Commercial 45 nm Node Device with High-k/Metal Gate Stack by Atom Probe Tomography
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Koji Inoue | Yasuyoshi Nagai | Takeshi Toyama | Yasuo Shimizu | Hideki Hashimoto | Takahiro Miyagi | Naohiko Kawasaki | Yoshitsugu Nakagawa | Hisashi Takamizawa | Naoyuki Sugiyama | H. Hashimoto | T. Toyama | Y. Shimizu | Y. Nagai | Y. Nakagawa | Jun Kato | Katsuyuki Kitamoto | Akiya Karen | H. Takamizawa | N. Sugiyama | K. Kitamoto | A. Karen | N. Kawasaki | J. Kato | K. Inoue | T. Miyagi
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