Optimized growth of BGaAs by molecular beam epitaxy

Abstract B x Ga (1− x ) As alloys have been grown by molecular beam epitaxy. Reducing growth temperature below 540°C and increasing the V/III flux ratio above 20 improved boron incorporation in the epitaxial layers while preserving crystal quality. Higher growth temperatures and lower V/III ratios lead to significant amounts of B incorporation on interstitial lattice sites. With optimized growth conditions, pseudomorphic B x Ga (1− x ) As films with x =0.078 have been grown with good crystal quality and no detectable interstitial B incorporation.