Advanced laser-produced EUV light source for HVM with conversion efficiency of 5-7% and B-field mitigation of ions
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Hiroaki Nishimura | Yoshinori Shimada | Keiji Nagai | Katsunobu Nishihara | N. Miyanaga | M. Murakami | Atsushi Sunahara | Akira Sasaki | V. Zhakhovskii | Hiromitsu Furukawa | Takeshi Nishikawa | Kazumi Fujima | Fumihiro Koike | Richard M. More | Takako Kato | Hajime Tanuma | Masanori Nunami | Hiroki R. Ueda | Y. Izawa | K. Mima | T. Aota | S. Fujioka | K. Gamata | Y. Yuba | M. Murakami | Y. Izawa | K. Mima | N. Miyanaga | S. Fujioka | H. Nishimura | M. Nunami | A. Sasaki | K. Nishihara | T. Nishikawa | F. Koike | H. Tanuma | T. Aota | K. Gamata | H. Ueda | Y. Yuba | Y. Shimada | H. Furukawa | T. Kato | A. Sunahara | V. Zhakhovskii | K. Nagai | K. Fujima | R. More
[1] V. G. Pal’chikov,et al. Reference data on multicharged ions , 1994 .
[2] John D. Gillaspy,et al. EUV Sources for Lithography, ed. by V. Bakshi , 2006 .