Performance of a two-mirror, four-reflection, ring-field optical system at {lambda}=13 nm

Performance of an Extreme Ultraviolet Lithography (EUVL) imaging optic was characterized by printing resolution test images in resist. While features as small as 0.137 {mu}m were successfully printed, a resolution of 0.175 {mu}m better represents the performance of the system over the full 0.9 mm{sup 2} image field. The contrast of the aerial image was estimated to be about 40% or less for the fine features printed. This low contrast value is attributed to a degradation of the modulation transfer function due to presence of scattered light in the image.