Electronic structure of α-Al2O3: Ab initio simulations and comparison with experiment
暂无分享,去创建一个
Hei Wong | Vladimir A. Gritsenko | J. Han | V. Gritsenko | Him Cheng Wong | T. Perevalov | A. V. Shaposhnikov | C. W. Kim | T. V. Perevalov | J. H. Han | A. Shaposhnikov | C. Kim
[1] Philippe Roussel,et al. Charge trapping and dielectric reliability of SiO/sub 2/-Al/sub 2/O/sub 3/ gate stacks with TiN electrodes , 2003 .
[2] Chenming Hu,et al. MOSFET gate leakage modeling and selection guide for alternative gate dielectrics based on leakage considerations , 2003 .
[3] J. Levinson,et al. Photo-induced tunnel currents in Al-Al2O3-Au structures , 1975 .
[4] Ching,et al. Electronic structure and optical properties of alpha and beta phases of silicon nitride, silicon oxynitride, and with comparison to silicon dioxide. , 1995, Physical review. B, Condensed matter.
[5] Ching,et al. Self-consistent band structures, charge distributions, and optical-absorption spectra in MgO, alpha -Al2O3, and MgAl2O4. , 1991, Physical review. B, Condensed matter.
[6] J. Robertson. High dielectric constant oxides , 2004 .
[7] Chang,et al. Excitons and optical properties of alpha-quartz , 2000, Physical review letters.
[8] John Robertson,et al. Band offsets and Schottky barrier heights of high dielectric constant oxides , 2002 .
[9] M. Igarashi,et al. Electronic Structure of Al2O3 Thin Film Studied Using First-Principle Band Calculation , 2003 .
[10] J. Yeh,et al. Atomic calculation of photoionization cross-sections and asymmetry parameters , 1993 .
[11] Jo-Won Lee,et al. A new low voltage fast SONOS memory with high-k dielectric , 2003 .
[12] Roger H. French,et al. Optical reflectivity measurements using a laser plasma light source , 1989 .
[13] Jon-Paul Maria,et al. Alternative dielectrics to silicon dioxide for memory and logic devices , 2000, Nature.
[14] R. Wallace,et al. High-κ gate dielectrics: Current status and materials properties considerations , 2001 .