GaN-Based RF Power Devices and Amplifiers
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Umesh K. Mishra | Likun Shen | Thomas E. Kazior | Yi-Feng Wu | T. Kazior | U. Mishra | L. Shen | YiFeng Wu | Likun Shen
[1] A. Kurdoghlian,et al. GaN double heterojunction field effect transistor for microwave and millimeterwave power applications , 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..
[2] Michael S. Shur,et al. Current/voltage characteristic collapse in AlGaN/GaN heterostructure insulated gate field effect transistors at high drain bias , 1994 .
[3] M. Shur,et al. Novel high power AlGaN/GaN HFETs on SiC substrates , 1997, International Electron Devices Meeting. IEDM Technical Digest.
[4] S. Denbaars,et al. AlN/GaN and (Al,Ga)N/AlN/GaN two-dimensional electron gas structures grown by plasma-assisted molecular-beam epitaxy , 2001 .
[5] P. Parikh,et al. 40-W/mm Double Field-plated GaN HEMTs , 2006, 2006 64th Device Research Conference.
[6] Michael S. Shur,et al. The influence of the strain‐induced electric field on the charge distribution in GaN‐AlN‐GaN structure , 1993 .
[7] S. Keller,et al. AlGaN/GaN high electron mobility transistors with InGaN back-barriers , 2006, IEEE Electron Device Letters.
[8] Michael S. Shur,et al. Electron transport in AlGaN–GaN heterostructures grown on 6H–SiC substrates , 1998 .
[9] U. Mishra,et al. p-capped GaN-AlGaN-GaN high-electron mobility transistors (HEMTs) , 2002, IEEE Electron Device Letters.
[10] F. Recht,et al. Nonalloyed ohmic contacts in AlGaN/GaN HEMTs by ion implantation with reduced activation annealing temperature , 2006, IEEE Electron Device Letters.
[11] S. Keller,et al. High-power AlGaN/GaN HEMTs for Ka-band applications , 2005, IEEE Electron Device Letters.
[12] S. Denbaars,et al. Progress in gallium nitride-based bipolar transistors , 2001, Proceedings of the 2001 BIPOLAR/BiCMOS Circuits and Technology Meeting (Cat. No.01CH37212).
[13] T. Takagi,et al. S and C band over 100 W GaN HEMT 1-chip high power amplifiers with cell division configuration , 2005, European Gallium Arsenide and Other Semiconductor Application Symposium, GAAS 2005.
[14] S. Mizuno,et al. High-efficiency and wide-band single-ended 200W GaN HEMT power amplifier for 2.1 GHz W-CDMA base station application , 2005, 2005 Asia-Pacific Microwave Conference Proceedings.
[15] Gerard J. Sullivan,et al. Low resistance ohmic contacts on AlGaN/GaN structures using implantation and the “advancing” Al/Ti metallization , 1999 .
[16] Walter Kruppa,et al. Trapping effects and microwave power performance in AlGaN/GaN HEMTs , 2001 .
[17] L. Eastman,et al. The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMTs , 2000, IEEE Electron Device Letters.
[18] F. Recht,et al. AlGaN/GaN HEMTs with Large Angle Implanted Nonalloyed Ohmic Contacts , 2007, 2007 65th Annual Device Research Conference.
[19] B. V. Shanabrook,et al. Molecular beam epitaxy of beryllium-doped GaN buffer layers for AlGaN/GaN HEMTs , 2002, International Conference on Molecular Bean Epitaxy.
[20] S. Denbaars,et al. GaN–GaN junctions with ultrathin AlN interlayers: Expanding heterojunction design , 2002 .
[21] M. Moore,et al. Linearity performance of GaN HEMTs with field plates , 2004, Conference Digest [Includes 'Late News Papers' volume] Device Research Conference, 2004. 62nd DRC..
[22] U. Mishra,et al. 30-W/mm GaN HEMTs by field plate optimization , 2004, IEEE Electron Device Letters.
[23] U. Mishra,et al. Ion implanted AlGaN-GaN HEMTs with nonalloyed Ohmic contacts , 2005, IEEE Electron Device Letters.
[24] H. Xing,et al. Selective dry etching of GaN over AlGaN in BCl/sub 3//SF/sub 6/ mixtures , 2004, Proceedings. IEEE Lester Eastman Conference on High Performance Devices, 2004..
[25] S. Denbaars,et al. Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment , 2006, IEEE Electron Device Letters.
[26] M. Asif Khan,et al. Observation of a two‐dimensional electron gas in low pressure metalorganic chemical vapor deposited GaN‐AlxGa1−xN heterojunctions , 1992 .
[27] Umesh K. Mishra,et al. Gallium nitride based high power heterojunction field effect transistors: process development and present status at UCSB , 2001 .
[28] P. Janke,et al. High performance microwave power GaN/AlGaN MODFETs grown by RF-assisted MBE , 2000 .
[29] W. Hoke,et al. Rapid silicon outdiffusion from SiC substrates during molecular-beam epitaxial growth of AlGaN∕GaN∕AlN transistor structures , 2005 .
[30] T. Li,et al. Reliability of large periphery GaN-on-Si HFETs , 2005, [Reliability of Compound Semiconductors] ROCS Workshop, 2005..
[31] Y. Okamoto,et al. 10-W/mm AlGaN-GaN HFET with a field modulating plate , 2003, IEEE Electron Device Letters.
[32] S. Sano,et al. A 100 W high-efficiency GaN HEMT amplifier for S-band wireless system , 2005, European Gallium Arsenide and Other Semiconductor Application Symposium, GAAS 2005.
[33] D. Lang,et al. AlGaN/GaN HEMTs grown by MBE on semi-insulating HVPE GaN templates , 2002, Device Research Conference.
[34] S. Yokokawa,et al. An over 200-W output power GaN HEMT push-pull amplifier with high reliability , 2004, 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535).
[35] H. A. Hung,et al. AlGaN/GaN $Ka$-Band 5-W MMIC Amplifier , 2006, IEEE Transactions on Microwave Theory and Techniques.
[36] W. Hoke,et al. Reaction of molecular beam epitaxial grown AlN nucleation layers with SiC substrates , 2006 .
[37] J. Milligan,et al. High power hybrid and MMIC amplifiers using wide-bandgap semiconductor devices on semi-insulating SiC substrates , 2002, 60th DRC. Conference Digest Device Research Conference.
[38] Y.-F. Wu,et al. An Internally-matched GaN HEMT Amplifier with 550-watt Peak Power at 3.5 GHz , 2006, 2006 International Electron Devices Meeting.
[39] T. Inada,et al. Silicon implantation in epitaxial GaN layers: Encapsulant annealing and electrical properties , 2004 .
[40] Paul Saunier,et al. Effects of AlGaN/GaN HEMT structure on RF reliability , 2005 .
[41] Christiane Poblenz,et al. Effect of carbon doping on buffer leakage in AlGaN/GaN high electron mobility transistors , 2004 .
[42] A. Tarakji,et al. Submicron gate Si3N4/AlGaN/GaN-metal-insulator-semiconductor heterostructure field-effect transistors , 2003, IEEE Electron Device Letters.
[43] R. Coffie,et al. AlGaN/AlN/GaN high-power microwave HEMT , 2001, IEEE Electron Device Letters.
[44] F. Ren,et al. Activation characteristics of ion-implanted Si+ in AlGaN , 2005 .
[45] A. Kurdoghlian,et al. GaN HFET for W-band Power Applications , 2006, 2006 International Electron Devices Meeting.
[46] M. Asif Khan,et al. High electron mobility transistor based on a GaN‐AlxGa1−xN heterojunction , 1993 .
[47] Y.-F. Wu,et al. 8-watt GaN HEMTs at millimeter-wave frequencies , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..
[48] Y.C. Chen,et al. Impact of A1N Interalayer on Reliability of AlGaN/GaN HEMTS , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[49] T. Kikkawa. Recent progress and future prospects of GaN HEMTs for base-station applications , 2004, IEEE Compound Semiconductor Integrated Circuit Symposium, 2004..
[50] P. Waltereit,et al. Power performance of AlGaN-GaN HEMTs grown on SiC by plasma-assisted MBE , 2004, IEEE Electron Device Letters.
[51] Y.-F. Wu,et al. High Al-content AlGaN/GaN HEMTs on SiC substrates with very high power performance , 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).
[52] T. Mimura,et al. Cat-CVD SiN insulated-gate AlGaN/GaN HFETs with 163 GHz f/sub T/ and 184 GHz f/sub max/ , 2005, 63rd Device Research Conference Digest, 2005. DRC '05..
[53] E. Johnson. Physical limitations on frequency and power parameters of transistors , 1965 .
[54] Umesh K. Mishra,et al. 12 W/mm power density AlGaN/GaN HEMTs on sapphire substrate , 2004 .
[55] J. B. Webb,et al. Reproducibility of growing AlGaN/GaN high-electron-mobility-transistor heterostructures by molecular-beam epitaxy , 2000 .
[56] U. Mishra,et al. AlGaN/GaN HEMTs-an overview of device operation and applications , 2002, Proc. IEEE.
[57] T. Kazior,et al. Trapping effects in GaN and SiC microwave FETs , 2002, Proc. IEEE.
[58] R. Birkhahn,et al. High performance GaN HEMTs at 40 GHz with power density of 2.8W/mm , 2003, IEEE International Electron Devices Meeting 2003.
[59] Umesh K. Mishra,et al. Growth of Fe doped semi-insulating GaN by metalorganic chemical vapor deposition , 2002 .
[60] Toshiaki Matsui,et al. 30-nm-gate AlGaN/GaN MIS-HFETs with 180 GHz fT , 2006, 2006 64th Device Research Conference.
[61] L. Larson,et al. 50% PAE WCDMA basestation amplifier implemented with GaN HFETs , 2005, IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05..
[62] M. Asif Khan,et al. Metal semiconductor field effect transistor based on single crystal GaN , 1993 .
[63] J. Collet. Solid-State Electronics , 1963, Nature.
[64] Effect of p-doped overlayer thickness on RF-dispersion in GaN junction FETs , 2002, IEEE Electron Device Letters.
[65] Y.-F. Wu,et al. Measured microwave power performance of AlGaN/GaN MODFET , 1996, IEEE Electron Device Letters.
[66] J. Chyi,et al. Performance enhancement by using the n/sup +/-GaN cap layer and gate recess technology on the AlGaN-GaN HEMT fabrication , 2005, IEEE Electron Device Letters.
[67] S. Yokokawa,et al. A 174 W high-efficiency GaN HEMT power amplifier for W-CDMA base station applications , 2003, IEEE International Electron Devices Meeting 2003.
[68] R. Coffie,et al. High-power polarization-engineered GaN/AlGaN/GaN HEMTs without surface passivation , 2004, IEEE Electron Device Letters.
[69] H. Zirath,et al. Comparison of the DC and Microwave Performance of AlGaN/GaN HEMTs Grown on SiC by MOCVD With Fe-Doped or Unintentionally Doped GaN Buffer Layers , 2006, IEEE Transactions on Electron Devices.
[70] D.C. Streit,et al. The future of compound semiconductors for aerospace and defense applications , 2005, IEEE Compound Semiconductor Integrated Circuit Symposium, 2005. CSIC '05..
[71] Yugang Zhou,et al. AlGaN/GaN/InGaN/GaN DH-HEMTs with an InGaN notch for enhanced carrier confinement , 2006, IEEE Electron Device Letters.
[72] A. Vescan,et al. 12 W/mm AlGaN-GaN HFETs on silicon substrates , 2004, IEEE Electron Device Letters.
[73] Lester F. Eastman,et al. An AlGaN/GaN high-electron-mobility transistor with an AlN sub-buffer layer , 2002 .
[74] A. Lunev,et al. AlGaN/GaN metal oxide semiconductor heterostructure field effect transistor , 2000, IEEE Electron Device Letters.
[75] H.P. Moyer,et al. Ka-band MMIC power amplifier in GaN HFET technology , 2004, 2004 IEEE MTT-S International Microwave Symposium Digest (IEEE Cat. No.04CH37535).
[76] M. Kanamura,et al. A 100-W high-gain AlGaN/GaN HEMT power amplifier on a conductive n-SiC substrate for wireless base station applications , 2004, IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004..
[77] S. Denbaars,et al. Power and linearity characteristics of GaN MISFETs on sapphire substrate , 2004, IEEE Electron Device Letters.
[78] Michael S. Shur,et al. Insulating gate III-N heterostructure field-effect transistors for high-power microwave and switching applications , 2003 .
[79] D.S. Katzer,et al. Improved reliability of AlGaN-GaN HEMTs using an NH/sub 3/ plasma treatment prior to SiN passivation , 2005, IEEE Electron Device Letters.
[80] G. Simin,et al. Stable CW operation of field-plated GaN-AlGaN MOSHFETs at 19 W/mm , 2005, IEEE Electron Device Letters.