Fabrication of 3.5 GHz surface acoustic wave filters by ion projection lithography

Abstract By applying ion projection lithography an SAW device with 0.3 μm lines and spaces has been printed on a quartz substrate. The problem of complementary masks connected with the use of open stencil masks was solved in this special situation of a linear design by an exposure technique with subsequent stepping in the direction of the lines. The device was characterized by its filter response curve displaying the strongest band pass at 1.5 GHz.