Proximity Effect in E-beam Lithography 1 Proximity Effect in E-beam Lithography

Electron beam lithography is able to provide high resolution patterning. However, the effect of electron scattering in resist and substrate leads to an undesired influence in the regions adjacent to those exposed by the electron beam. This effect is called the proximity effect. This paper presents a study on the cause of the proximity effect and methods to correct for it.

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