Characterization and simulation of surface and line-edge roughness in photoresists
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Angeliki Tserepi | Evangelos Gogolides | George P. Patsis | E. Valamontes | V. Constantoudis | E. Gogolides | V. Constantoudis | A. Tserepi | G. Patsis | E. Valamontes
[1] Daisuke Kawamura,et al. Line-edge roughness of chemically amplified resists , 2000, Advanced Lithography.
[2] James W. Taylor,et al. Correlation of atomic force microscopy sidewall roughness measurements with scanning electron microscopy line-edge roughness measurements on chemically amplified resists exposed by x-ray lithography , 1999 .
[3] F. Cerrina,et al. Process dependence of roughness in a positive-tone chemically amplified resist , 1998 .
[4] E. Irene,et al. Investigation of roughened silicon surfaces using fractal analysis. I. Two‐dimensional variation method , 1994 .
[5] K. Ronse,et al. Metrology method for the correlation of line edge roughness for different resists before and after etch , 2001 .
[6] S. Zucker,et al. Evaluating the fractal dimension of profiles. , 1989, Physical review. A, General physics.
[7] Surface and line-edge roughness in plasma-developed resists , 2001 .
[8] Evangelos Gogolides,et al. Simulation of surface and line-edge roughness formation in resists , 2001 .
[9] D. Bonnell,et al. Quantitative topographic analysis of fractal surfaces by scanning tunneling microscopy , 1990 .
[10] Ioannis Raptis,et al. An advanced epoxy novolac resist for fast high-resolution electron-beam lithography , 1995 .
[11] Eugene A. Irene,et al. Area evaluation of microscopically rough surfaces , 1999 .
[12] Kenji Yamazaki,et al. Influence of edge roughness in resist patterns on etched patterns , 1998 .
[13] Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation , 2000 .
[14] Georg Pawlowski,et al. Lithography and line-edge roughness of high-activation-energy resists , 2000, Advanced Lithography.