Characterization and simulation of surface and line-edge roughness in photoresists

The problem of surface and line-edge roughness characterization and prediction is discussed. Different roughness parameters, such as the root mean square deviation (rms or σ), the fractal dimension, and the Fourier spectrum, are presented and compared. These roughness parameters for three negative tone resists (wet and plasma developed) are analyzed versus exposure dose, photoacid generator concentration, and plasma development conditions. Finally, a molecular type simulator is used to predict the experimental roughness behavior.

[1]  Daisuke Kawamura,et al.  Line-edge roughness of chemically amplified resists , 2000, Advanced Lithography.

[2]  James W. Taylor,et al.  Correlation of atomic force microscopy sidewall roughness measurements with scanning electron microscopy line-edge roughness measurements on chemically amplified resists exposed by x-ray lithography , 1999 .

[3]  F. Cerrina,et al.  Process dependence of roughness in a positive-tone chemically amplified resist , 1998 .

[4]  E. Irene,et al.  Investigation of roughened silicon surfaces using fractal analysis. I. Two‐dimensional variation method , 1994 .

[5]  K. Ronse,et al.  Metrology method for the correlation of line edge roughness for different resists before and after etch , 2001 .

[6]  S. Zucker,et al.  Evaluating the fractal dimension of profiles. , 1989, Physical review. A, General physics.

[7]  Surface and line-edge roughness in plasma-developed resists , 2001 .

[8]  Evangelos Gogolides,et al.  Simulation of surface and line-edge roughness formation in resists , 2001 .

[9]  D. Bonnell,et al.  Quantitative topographic analysis of fractal surfaces by scanning tunneling microscopy , 1990 .

[10]  Ioannis Raptis,et al.  An advanced epoxy novolac resist for fast high-resolution electron-beam lithography , 1995 .

[11]  Eugene A. Irene,et al.  Area evaluation of microscopically rough surfaces , 1999 .

[12]  Kenji Yamazaki,et al.  Influence of edge roughness in resist patterns on etched patterns , 1998 .

[13]  Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation , 2000 .

[14]  Georg Pawlowski,et al.  Lithography and line-edge roughness of high-activation-energy resists , 2000, Advanced Lithography.