Tilt angle and dose rate monitoring of low energy ion implantation processes with photomodulated reflectance measurement : AM: Advanced Metrology
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Edward D. Moore | Z. Zolnai | A. Pongrácz | F. Ujhelyi | Ö. Sepsi | L. Rubin | J. Byrnes | G. Nadudvari | J. Szívós | Á. Kun