Effect of the film thickness on the crystal structure and ferroelectric properties of (Hf0.5Zr0.5)O2 thin films deposited on various substrates
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H. Funakubo | O. Sakata | Takao Shimizu | T. Shiraishi | H. Uchida | Y. Imai | T. Kiguchi | T. Konno | T. Oikawa | Kiliha Katayama | T. Yokouchi