论文信息 - High-κ Dielectric Materials for Microelectronics

High-κ Dielectric Materials for Microelectronics

This article reviews the current status of high-κ dielectric materials for microelectronics. In particular, recent work impacting the integration of these high-κ materials for gate dielectric and capacitor applications in advanced scaled microelectronic devices is reviewed.

Robert M. Wallace | Glen D. Wilk | R. Wallace | G. Wilk

[1] Shyam P Murarka,et al. Silicides for VLSI Applications , 1983 .

[2] S. O. Kasap,et al. Principles of electrical engineering materials and devices , 1996 .

[3] L. Pankratz,et al. Thermodynamic properties of elements and oxides , 1982 .

[4] Ramamoorthy Ramesh,et al. Thin Film Ferroelectric Materials and Devices , 1997 .

[5] Takashi Hori,et al. Gate Dielectrics and MOS ULSIs , 1997 .