论文信息 - 25 nm-wide silicon wire fabrication with i-line photolithography for efficient spot size converters - 字舞流文

25 nm-wide silicon wire fabrication with i-line photolithography for efficient spot size converters

H. Kawashima | M. Okano | N. Ichimura | M. Mori | Y. Shoji | T. Kamei | Y. Sakakibara | K. Kintaka | K. Nakanishi | E. Itoga | T. Masakage