A new concept for mass production of large area thin-film silicon solar cells on glass

[1]  A. Matsuda,et al.  High-rate growth of microcrystalline silicon films using a high-density SiH4/H2 glow-discharge plasma , 2004 .

[2]  H. Schade,et al.  State-of-the-art mid-frequency sputtered ZnO films for thin-film silicon solar cells and modules , 2003 .

[3]  J. Müller,et al.  Amorphous and Microcrystalline Silicon Based Solar Cells and Modules on Textured Zinc Oxide Coated Glass Substrates , 2003 .

[4]  Kenji Yamamoto,et al.  Large area thin film Si module , 2002 .

[5]  J. Springer,et al.  New materials and deposition techniques for highly efficient silicon thin film solar cells , 2002 .

[6]  J. Müller,et al.  Amorphous and microcrystalline silicon solar cells prepared at high deposition rates using RF (13.56 MHz) plasma excitation frequencies , 2001 .

[7]  Diego Fischer,et al.  Microcrystalline/micromorph silicon thin-film solar cells prepared by VHF-GD technique , 2001 .

[8]  Bernd Rech,et al.  Intrinsic microcrystalline silicon: A new material for photovoltaics , 2000 .

[9]  B. Szyszka.  Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering , 1999 .

[10]  B. Rech,et al.  Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells , 1999 .

[11]  A. Matsuda,et al.  High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition , 1998 .

[12]  A. Howling,et al.  Large Area Deposition of Amorphous and Microcrystalline Silicon by Very High Frequency Plasma , 1998 .