Acid and base diffusion in chemically amplified DUV resists
暂无分享,去创建一个
Toshiro Itani | Kunihiko Kasama | Mitsuharu Yamana | Shuichi Hashimoto | Norihiko Samoto | Hiroshi Yoshino
[1] Shinji Okazaki,et al. Suppression of Acid Diffusion in Chemical Amplification Resists by Molecular Control of Base Matrix Polymers , 1995 .
[2] A. Tanaka,et al. Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography , 1991 .
[3] Toshiro Itani,et al. Dissolution Kinetics Analysis for Chemically Amplified Deep Ultraviolet Resist , 1994 .
[4] James W. Thackeray,et al. Effect of acid diffusion on performance in positive deep ultraviolet resists , 1994 .
[5] Akinobu Tanaka,et al. The effect of an organic base in chemically amplified resist on patterning characteristics using KrF lithography , 1994 .