Thermodynamic stability of high-K dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2
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Raghaw Rai | Rama I. Hegde | Maciej Gutowski | Philip J. Tobin | M. Stoker | M. Gutowski | J. Jaffe | R. Hegde | R. Rai | P. Tobin | John E. Jaffe | Chun-Li Liu | Matt Stoker | Chun-Li Liu
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