LETTER TO THE EDITOR: Thermal stability of Pt- and Ni-based Schottky contacts on GaN and Al0.31Ga0.69N

In this work we analyse the performance of Pt- and Ni-based Schottky metallizations on AlxGa1−xN (x = 0, 0.31). An intermediate thin Ti layer is shown to enhance the thermal stability of Pt/Au, and leads to an increase of the Schottky barrier height. Pt/Ti/Au contacts on GaN provide a barrier height of 1.18 ± 0.07 eV, increasing up to 2.0 ± 0.1 eV on Al0.31Ga0.69N. Further improvement of Schottky contacts is achieved by surface passivation with plasma-enhanced chemical vapour deposited SiO2 or SixNy, which reduces the leakage current by two orders of magnitude and structural modifications in the metal due to thermal ageing.

[1]  Chin-An Chang Ambient dependence of the interactions in Pt/Ni/Cu and Au/Ni/Cu structures , 1987 .

[2]  R. Belser,et al.  Alloying Behavior of Thin Bimetal Films, Simultaneously or Successively Deposited , 1960 .

[3]  Lester F. Eastman,et al.  Undoped AlGaN/GaN HEMTs for microwave power amplification , 2001 .

[4]  Walter Kruppa,et al.  Trapping effects and microwave power performance in AlGaN/GaN HEMTs , 2001 .

[5]  H. C. Casey,et al.  Low interface trap density for remote plasma deposited SiO2 on n‐type GaN , 1996 .

[6]  Günther Tränkle,et al.  Reliability considerations of III-nitride microelectronic devices , 1999 .

[7]  N. B. Smirnov,et al.  Schottky Diodes on MOCVD Grown AlGaN Films. , 1998 .

[8]  Michael S. Shur,et al.  SiO2-passivated lateral-geometry GaN transparent Schottky-barrier detectors , 2000 .

[9]  D. Cahill,et al.  Dewetting and nanopattern formation of thin Pt films on SiO2 induced by ion beam irradiation , 2001 .

[10]  Electrical Characteristics of Schottky Contacts on GaN and Al0.11Ga0.89N , 2000 .

[11]  J. Redwing,et al.  Ni and Ni silicide Schottky contacts on n-GaN , 1998 .

[12]  Characterisation of Pd Schottky barrier on n-type GaN , 1996 .

[13]  Fu-Rong Chen,et al.  Microstructural investigation of oxidized Ni/Au ohmic contact to p-type GaN , 1999 .

[14]  L. Eastman,et al.  The effect of surface passivation on the microwave characteristics of undoped AlGaN/GaN HEMTs , 2000, IEEE Electron Device Letters.

[15]  M. Umeno,et al.  Investigations of SiO2/n-GaN and Si3N4/n-GaN insulator–semiconductor interfaces with low interface state density , 1998 .

[16]  Oliver Ambacher,et al.  Group-III-Nitride Based Gas Sensing Devices , 2001 .

[17]  Manijeh Razeghi,et al.  High-speed, low-noise metal–semiconductor–metal ultraviolet photodetectors based on GaN , 1999 .

[18]  Chun-Yen Chang,et al.  Schottky contact and the thermal stability of Ni on n-type GaN , 1996 .

[19]  E. Haller,et al.  High temperature behavior of Pt and Pd on GaN , 1997 .

[20]  K. Hiramatsu,et al.  A study on barrier height of AuAlxGa1 − xN Schottky diodes in the range 0 ≤ x ≤ 0.20 , 1997 .

[21]  I. Moerman,et al.  Material optimisation for AlGaN/GaN HFET applications , 2001 .

[22]  R. Molnar,et al.  Approaches to designing thermally stable Schottky contacts to n-GaN , 1999 .

[23]  E. Muñoz,et al.  AlGaN metal–semiconductor–metal photodiodes , 1999 .

[24]  Barrier heights of GaN Schottky contacts , 1997 .

[25]  M. Umeno,et al.  Effects of annealing on Ti, Pd, and Ni/n-Al/sub 0.11/Ga/sub 0.89/N Schottky diodes , 2001 .

[26]  S. Mohney,et al.  Interfacial reactions between nickel thin films and GaN , 1997 .

[27]  Pierre Gibart,et al.  Analysis and modeling of AlxGa1−xN-based Schottky barrier photodiodes , 2000 .

[28]  Bernard Beaumont,et al.  METALORGANIC VAPOR-PHASE EPITAXY-GROWN ALGAN MATERIALS FOR VISIBLE-BLIND ULTRAVIOLET PHOTODETECTOR APPLICATIONS , 1999 .

[29]  U. Mishra,et al.  The impact of surface states on the DC and RF characteristics of AlGaN/GaN HFETs , 2001 .

[30]  M. Nathan,et al.  High barrier height GaN Schottky diodes: Pt/GaN and Pd/GaN , 1996 .

[31]  Ilesanmi Adesida,et al.  High temperature characteristics of Pd Schottky contacts on n-type GaN , 1996 .

[32]  K. Boutros,et al.  Ni and Ti Schottky barriers on n-AlGaN grown on SiC substrates , 1998 .

[33]  Oliver Ambacher,et al.  Electron affinity of AlxGa1−xN(0001) surfaces , 2001 .

[34]  Umesh K. Mishra,et al.  Gallium nitride based high power heterojunction field effect transistors: process development and present status at UCSB , 2001 .