Wet Chemical Oxidation to Improve Interfacial Properties of Al2O3/Si and Interface Analysis of Al2O3/SiOx/Si Structure Using Surface Carrier Lifetime Simulation and Capacitance–Voltage Measurement
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Hee‐eun Song | Sungeun Park | H. Lee | Yoonmook Kang | Donghwan Kim | M. Kang | K. Min | J. Lee | Myeong Sang Jeong | Sung-jin Choi