A Binary Tunnel Field Effect Transistor with a Steep Sub-threshold Swing and Increased ON Current
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[1] G. Amaratunga,et al. Silicon surface tunnel transistor , 1995 .
[2] Byung-Gook Park,et al. Tunneling Field-Effect Transistors (TFETs) With Subthreshold Swing (SS) Less Than 60 mV/dec , 2007, IEEE Electron Device Letters.
[3] P. R. Berger,et al. Si/SiGe Resonant Interband Tunneling Diodes Incorporating $\delta$-Doping Layers Grown by Chemical Vapor Deposition , 2009, IEEE Electron Device Letters.
[4] P. R. Berger,et al. Strain-Engineered Si/SiGe Resonant Interband Tunneling Diodes Grown on $\hbox{Si}_{0.8}\hbox{Ge}_{0.2}$ Virtual Substrates With Strained Si Cladding Layers , 2008, IEEE Electron Device Letters.
[5] K. Boucart,et al. Double-Gate Tunnel FET With High-$\kappa$ Gate Dielectric , 2007, IEEE Transactions on Electron Devices.
[6] I. Eisele,et al. Performance Enhancement of Vertical Tunnel Field-Effect Transistor with SiGe in the δp+ Layer , 2004 .
[7] M. Lundstrom,et al. On the validity of the parabolic effective-mass approximation for the I-V calculation of silicon nanowire transistors , 2005, IEEE Transactions on Electron Devices.
[8] A. Amara,et al. Tunnel field effect transistor with increased ON current, low-k spacer and high-k dielectric , 2010 .
[9] W. Kloosterman,et al. A new analytical diode model including tunneling and avalanche breakdown , 1992 .
[10] Qin Zhang,et al. Low-subthreshold-swing tunnel transistors , 2006, IEEE Electron Device Letters.
[11] I. Eisele,et al. P-Channel Tunnel Field-Effect Transistors down to Sub-50 nm Channel Lengths , 2006 .
[12] E. Nowak,et al. Crystallographic-Orientation-Dependent Gate-Induced Drain Leakage in Nanoscale MOSFETs , 2010, IEEE Transactions on Electron Devices.
[13] D. Frank,et al. Universal tunneling behavior in technologically relevant P/N junction diodes , 2004 .
[14] David J. Frank,et al. Power-constrained CMOS scaling limits , 2002, IBM J. Res. Dev..
[15] D.K. Sharma,et al. Gate Fringe-Induced Barrier Lowering in Underlap FinFET Structures and Its Optimization , 2008, IEEE Electron Device Letters.