The effects of layering in ferroelectric Si-doped HfO2 thin films
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Jacob L. Jones | T. Nishida | S. Moghaddam | C. M. Fancher | Yang Liu | P. Lomenzo | Chuanzhen Zhou | Q. Takmeel | C. Fancher
暂无分享,去创建一个
Jacob L. Jones | T. Nishida | S. Moghaddam | C. M. Fancher | Yang Liu | P. Lomenzo | Chuanzhen Zhou | Q. Takmeel | C. Fancher