GaN-based MIS-HEMTs with Al2O3 dielectric deposited by low-cost and environmental-friendly mist-CVD technique
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J. T. Asubar | H. Tokuda | M. Kuzuhara | Yusui Nakamura | K. Naito | A. Baratov | R. Low | S. Kamiya | I. Nagase | S. Urano | S. Kawabata | Tomohiro Motoyama | Zenji Yatabe | J. Asubar