论文信息 - Study of Al2O3 thin films by ALD using H2O and O3 as oxygen source for waveguide applications - 字舞流文

Study of Al2O3 thin films by ALD using H2O and O3 as oxygen source for waveguide applications

E. G. Lizarraga-Medina | H. Marquez | H. Tiznado | H. A. Borbón-Nuñez | O. Contreras-López | D. L. Caballero-Espitia | H. Borbón-Nuñez | H. A. Borbón-Nuñez | E. G. Lizarraga-Medina | D. L. Caballero-Espitia | O. E. Contreras-Lopez