论文信息 - New technique for producing thin boron films

New technique for producing thin boron films

Abstract A review will be presented of methods for producing thin boron films in high-vacuum processes applying electron bombardment and resistive heating to evaporate the boron. Previous papers have noted the problem of sputtering of the boron source during the evaporation. A method for reducing sputter-coating will be described.

G. E. Thomas

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