Advanced Plasma Etching Processes and Its Future Prospects
暂无分享,去创建一个
[1] S. Samukawa,et al. Low-damage atomic layer modification of self-assembled monolayer using neutral beam process , 2006 .
[2] T. Fuyuki,et al. Coulomb-staircase observed in silicon-nanodisk structures fabricated by low-energy chlorine neutral beams , 2007 .
[3] S. Samukawa,et al. Ultraviolet-induced damage in fluorocarbon plasma and its reduction by pulse-time-modulated plasma in charge coupled device image sensor wafer processes , 2004 .