Characterization of fluorine-doped silicon dioxide film by Raman spectroscopy
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[1] Jong-Wan Park,et al. Effect of fluorine on dielectric properties of SiOF films , 1996 .
[2] Hong-young Chang,et al. The deposition of SiOF film with low dielectric constant in a helicon plasma source , 1996 .
[3] G. Katagiri,et al. Characterization of anisotropic stress around Si trenches by polarized Raman spectroscopy , 1995 .
[4] Y. Hibino,et al. Component Assignments of the Raman Spectrum from Highly Elongated Silica Glass Filbers , 1987 .
[5] F. L. Galeener. Planar rings in glasses , 1982 .
[6] P. Dumas,et al. Raman spectral characterization of pure and fluorine‐doped vitreous silica material , 1982 .
[7] F. L. Galeener,et al. Thermal equilibration of raman active defects in vitreous silica , 1980 .
[8] K. Nakamoto. Infrared and Raman Spectra of Inorganic and Coordination Compounds , 1978 .