论文信息 - Characterization of thermally stable Ir–Ta alloy thin films deposited by sputtering - 字舞流文

Characterization of thermally stable Ir–Ta alloy thin films deposited by sputtering

Y. Abe | K. Sasaki | E. Watanabe | S. Iura

[1] W. Cao,et al. Fatigue-free La-modified PbTiO3 thin films prepared by pulsed-laser deposition on Pt/Ti/SiO2/Si substrates , 2003 .

[2] M. K. Lee,et al. Co-sputtered Ru-Ti alloy electrodes for DRAM applications , 1999 .

[3] S. Desu,et al. Highly c-axis oriented Pb(Zr, Ti)O3 thin films grown on Ir electrode barrier and their electrical properties , 1999 .

[4] S. Sze,et al. Thermal Stability of Co-Sputtered Ru–Ti Alloy Electrodes for Dynamic Random Access Memory Applications , 1998 .

[5] Takashi Nakamura,et al. Fabrication Technology of Ferroelectric Memories , 1997 .

[6] K. Tokashiki,et al. RuO2/TiN-Based Storage Electrodes for (Ba, Sr)TiO3 Dynamic Random Access Memory Capacitors , 1995 .

[7] A. Kingon,et al. Influence of platinum interlayers on the electrical properties of RuO2/Pb(Zr0.53Ti0.47)O3/RuO2 capacitor heterostructures , 1995 .

[8] Hidemi Takasu,et al. Preparation of Pb(Zr,Ti)O3 thin films on electrodes including IrO2 , 1994 .

[9] R. Hammond,et al. Stability of amorphous transition‐metal films , 1978 .