A new sub-micron trench cell concept in ultrathin wafer technology for next generation 1200 V IGBTs
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[1] A. Philippou,et al. Automated vertical design optimization of a 1200V IGBT , 2015, 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
[2] A. Sakai,et al. On the scaling limit of the Si-IGBTs with very narrow mesa structure , 2016, 2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD).
[3] Frank Wolter,et al. Multi-dimensional trade-off considerations of the 750V micro pattern trench IGBT for electric drive train applications , 2015, 2015 IEEE 27th International Symposium on Power Semiconductor Devices & IC's (ISPSD).
[4] Y. Onozawa,et al. A 1200 V-class Fin P-body IGBT with ultra-narrow-mesas for low conduction loss , 2016, 2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD).
[5] T. Laska. The Field Stop IGBT (FS IGBT) A new device concept with a great improvement Potential , 2006 .
[6] S. Linder,et al. Exploring the Silicon Design Limits of Thin Wafer IGBT Technology: The Controlled Punch Through (CPT) IGBT , 2008, 2008 20th International Symposium on Power Semiconductor Devices and IC's.