Critical Dimension Calibration Standards for ULSI Metrology
暂无分享,去创建一个
Richard A. Allen | Ronald G. Dixson | Michael W. Cresswell | Christine E. Murabito | E. Hal Bogardus
[1] Richard A. Allen,et al. Comparison of properties of electrical test structures patterned in BESOI and SIMOX films for CD reference-material applications , 1998, Advanced Lithography.
[2] Richard A. Allen,et al. Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes , 1996 .
[4] H. Kumar Wickramasinghe,et al. Method for imaging sidewalls by atomic force microscopy , 1994 .
[5] M. W. Cresswell,et al. High-resolution transmission electron microscopy calibration of critical dimension (CD) reference materials , 2001 .
[6] Michael T. Postek,et al. Toward traceability for at-line AFM dimensional metrology , 2002, SPIE Advanced Lithography.
[7] L. W. Linholm,et al. Test structures for referencing electrical linewidth measurements to silicon lattice parameters using HRTEM , 2002, Proceedings of the 2002 International Conference on Microelectronic Test Structures, 2002. ICMTS 2002..
[8] Marylyn Hoy Bennett,et al. Implementation of Reference Measurement System using CD-AFM , 2003, SPIE Advanced Lithography.