Control of semiconductor manufacturing equipment: real-time feedback control of a reactive ion etcher
暂无分享,去创建一个
James Moyne | Pramod P. Khargonekar | Jessy W. Grizzle | Demosthenis Teneketzis | Pierre T. Kabamba | M. D. Giles | Jim Freudenberg | Fred L. Terry | J. P. Fournier | Michael E. Elta | Hossein Etemad | B. A. Rashap | Stéphane Lafortune | D. Teneketzis | J. Grizzle | J. Moyne | P. Khargonekar | J. Freudenberg | P. Kabamba | M. Elta | F. L. Terry | S. Lafortune | J. Fournier | H. Etemad | M. Giles
[1] Michael T. Mocella,et al. The Plasma Etching of Polysilicon with CF 3Cl / Argon Discharges I . Parametric Modeling and Impedance Analysis , 1986 .
[2] D. Manos,et al. Plasma etching : an introduction , 1989 .
[3] Pramod P. Khargonekar,et al. Real-time control of reactive ion etching: identification and disturbance rejection , 1993, Proceedings of 32nd IEEE Conference on Decision and Control.
[4] S. Balemi,et al. Supervisory control of a rapid thermal multiprocessor , 1993, IEEE Trans. Autom. Control..
[5] Mehrdad M. Moslehi,et al. Modeling, Identification, and Control of Rapid Thermal Processing Systems , 1994 .
[6] Tyrone L. Vincent,et al. Real-time feedback control of reactive ion etching , 1994, Other Conferences.
[7] Daniel L. Flamm,et al. Computer simulation of a CF4 plasma etching silicon , 1984 .
[8] James Moyne,et al. A generic cell controller for the automated VLSI manufacturing facility , 1992 .
[9] Vincent M. Donnelly,et al. Optical emission actinometry and spectral line shapes in rf glow discharges , 1984 .
[10] Jessy W. Grizzle,et al. Phenomenological modeling of plasma generation for real-time control of RIE systems , 1994, Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V.
[11] Thomas F. Edgar,et al. Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching II . Multivariable Control System Analysis of Manipulated, Measured, and Performance Variables , 1991 .
[12] B. A. Rashap,et al. Real-time feedback for sidewall profile control in reactive ion etching , 1995 .
[13] Stephanie Watts Butler. Etching and Polymerization in Fluorocarbon-Hydrogen Plasmas: Mathematical Modeling and Experimental Investigation. , 1991 .
[14] R. S. Gyurcsik,et al. A model for rapid thermal processing: achieving uniformity through lamp control , 1991 .
[15] G. Stein,et al. Multivariable feedback design: Concepts for a classical/modern synthesis , 1981 .
[16] Anne Simmons,et al. Plasma processing of materials: Scientific opportunities and technological challenges , 1991 .
[17] Costas J. Spanos. Statistical process control in semiconductor manufacturing , 1992 .
[18] P. T. Kabamba,et al. Applications of Control to Semiconductor Manufacturing: Reactive Ion Etching , 1993, 1993 American Control Conference.
[19] Ruey-Shan Guo,et al. Process control system for VLSI fabrication , 1991 .
[20] Herbert H. Sawin,et al. Monitoring and Control of Real Power in RF Plasma Processing , 1991 .
[21] S. Wolf,et al. Silicon Processing for the VLSI Era , 1986 .
[22] K. J. McLaughlin,et al. Real-time monitoring and control in plasma etching , 1991, IEEE Control Systems.
[23] Dale E. Seborg,et al. An Adaptive Nonlinear Control Strategy for Photolithography , 1993, 1993 American Control Conference.
[24] B. A. Rashap,et al. Nonlinear system identification and control of a reactive ion etcher , 1994, Proceedings of 1994 American Control Conference - ACC '94.
[25] Michael Lane Passow. Microwave, RF and hybrid reactor generated discharges for semiconductor processing. , 1991 .