The Helium Ion Microscope (HIM) offers a new, potentially disruptive technique for nano‐metrology. This methodology presents an approach to measurements for nanotechnology and nano‐manufacturing which has several potential advantages over the traditional scanning electron microscope (SEM) currently in use in integrated circuit research and manufacturing facilities across the world. Due to the very small, essentially one atom size, very high brightness source, and the shorter wavelength of the helium ions, it is theoretically possible to focus the ion beam into a smaller probe size relative to that of an electron beam of current SEMs. Hence higher resolution is theoretically achievable. In contrast to the SEM, when the helium ion beam interacts with the sample, it generates significantly smaller excitation volume and thus the image collected is more surface sensitive. Similarly to the SEM, the HIM also produces topographic, material, crystallographic, and potential contrast, and offers ways for investigati...