Series equivalent circuit representation of SiO2Si interface and oxide trap states

Abstract The small-signal frequency response of silicon dioxide-silicon interface and oxide trap states has been investigated and interpreted using a series R-C equivalent circuit model instead of the commonly used parallel R-C equivalent circuit model. It is shown that the series equivalent circuit model is advantageous in extracting the time constants of the oxide traps located in the silicon dioxide layer from experimental data and allows a determination of the spatial extension of the oxide traps. Comparisons of a two-step model, consisting of the Shockley-Read-Hall transition between the band and the interface states and the elastic tunneling transition between the interface and oxide trap states, with experimental data are given to illustrate the range of experimental data required to evaluate an unique set of tunneling and SRH parameters.