New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM
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Ute Buttgereit | Frank Schmidt | Konrad Knapp | Hans W. Becker | Frank Sobel | Holger Seitz | Nathalie Olschewski | Guenter Hess | Markus Renno | Pascal Schley
[1] Marc D. Levenson,et al. Wavefront Engineering for Photolithography , 1993 .
[2] Alfred Kwok-Kit Wong,et al. Resolution enhancement techniques in optical lithography , 2001 .
[3] Alex K. Raub,et al. Deep UV immersion interferometric lithography , 2003, SPIE Advanced Lithography.
[4] W. Hinsberg,et al. Liquid immersion deep-ultraviolet interferometric lithography , 1999 .
[5] P. Rai-Choudhury. Handbook of Microlithography, Micromachining, and Microfabrication, Volume 2: Micromachining and Microfabrication , 1997 .
[6] Jan Baselmans,et al. Extending optical lithography with immersion , 2004, SPIE Advanced Lithography.
[7] M. Levenson,et al. Improving resolution in photolithography with a phase-shifting mask , 1982, IEEE Transactions on Electron Devices.