High transconductance surface channel In0.53Ga0.47As MOSFETs using MBE source-drain regrowth and surface digital etching
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M. Rodwell | A. Gossard | V. Chobpattana | S. Stemmer | J. Law | B. Thibeault | A. Carter | Sanghoon Lee | Cheng-Ying Huang | W. Mitchell | D. Elias