Excellent rear side passivation on multi-crystalline silicon solar cells with 20 nm uncapped Al2O3 layer: Industrialization of ALD for solar cell applications
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E. Tois | E. Granneman | L. J. Geerligs | E. Bende | A. Mewe | A. Weeber | A. Burgers | P. Manshanden | I. Cesar | Y. Komatsu | P. Vermont