The half-metallic ferromagnetic chromium dioxide (Tc = 390 K) is a prospective material for spintronics applications. We employed pulsed laser deposition (PLD) to grow thin films of various chromium oxides. The experiments have been carried out in oxygen at different dynamical pressures, using a KrF* laser source (λ = 248 nm, τFWHM ≥ 30 ns), various chromium oxide targets, such as CrO3, Cr8O21 (the latter ones both pure and doped with Y and Sb respectively, for stabilization purposes) and sapphire substrates (c-cut). We optimized the laser fluence. To avoid CrO2 reduction to Cr2O3 in very thin films when kept in atmospheric air, we applied a protection with gold. X-ray diffraction, electron microscopy and Raman spectroscopy evidence uniform films containing CrO2.